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Niobium Target
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Product Introduction
Niobium target is an important material for physical research and semiconductor manufacturing.
Product Features
High melting point: Niobium has a high melting point, about 2477°C, so the niobium target has excellent high temperature resistance.
Good chemical stability: Niobium has good chemical stability and is not easy to react with other elements at room temperature, so the niobium target is not easy to oxidize or corrode during use.
High density: Niobium has a high density, about 8.57g/cm3, so the niobium target has a high mass absorption capacity.
Application areas
Physical research: Niobium targets are often used in the field of physical research, such as nuclear physics experiments, particle accelerators, plasma physics, etc., to produce high-energy ion beams or electron beams.
Semiconductor manufacturing: In semiconductor manufacturing processes, niobium targets are often used in processes such as physical vapor deposition (PVD) or magnetron sputtering (sputtering) to deposit or coat thin films to prepare electronic devices, optical devices, or coating materials.
Preparation method
Powder metallurgy method: niobium powder is prepared into a bulk or flake niobium target by pressing, sintering and other processes.
Melting method: Niobium can be prepared into a bulk or flake niobium target by vacuum melting or plasma arc melting.
special alloy
Sometimes, in order to improve the characteristics of the target, the niobium target may be added with other elements, such as chromium (Cr), titanium (Ti), etc., to adjust the performance and application range of the material.
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