Molybdenum-niobium target

Molybdenum-niobium target is an important material for physical research and semiconductor manufacturing. The following is the basic introduction of molybdenum niobium target: Molybdenum (Mo): Molybdenum is a transition metal element with excellent high temperature properties and chemical stability. In molybdenum-niobium targets, molybdenum is usually one of the main constituent elements. Niobium (Nb): Niobium is a transition metal element with good corrosion resistance and high temperature strength. In the molybdenum-niobium target, niobium is another important constituent element.

Classification:

Sputtering target

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Product Introduction

Molybdenum-niobium target is an important material for physical research and semiconductor manufacturing. The following is the basic introduction of molybdenum niobium target:

Molybdenum (Mo): Molybdenum is a transition metal element with excellent high temperature properties and chemical stability. In molybdenum-niobium targets, molybdenum is usually one of the main constituent elements.

Niobium (Nb): Niobium is a transition metal element with good corrosion resistance and high temperature strength. In the molybdenum-niobium target, niobium is another important constituent element.

Physical Performance

High melting point: Both molybdenum and niobium have high melting points, about 2623°C and 2477°C respectively, so the molybdenum-niobium target has excellent high temperature resistance.

High density: Both molybdenum and niobium have high densities, about 10.2g/cm3 and 8.57g/cm3, respectively, so the molybdenum-niobium target has a high mass absorption capacity.

Application areas

Physical research: Molybdenum-niobium targets are commonly used in the field of physical research, such as nuclear physics experiments, particle accelerators, plasma physics, etc., to produce high-energy ion beams or electron beams.

Semiconductor manufacturing: In semiconductor manufacturing processes, molybdenum-niobium targets are often used in processes such as physical vapor deposition (PVD) or magnetron sputtering (sputtering) to deposit or coat thin films to prepare electronic devices, optical devices, or coating materials.

Preparation method

Powder metallurgy method: molybdenum and niobium powder are mixed according to a certain proportion, after pressing, sintering and other processes to prepare a massive or flaky molybdenum niobium target.

Melting method: Molybdenum and niobium can be prepared by vacuum melting or plasma arc melting into a massive or flaky molybdenum-niobium target.

special alloy

Sometimes, in order to improve the characteristics of the target, the molybdenum-niobium target may be added with other elements, such as chromium (Cr), titanium (Ti), etc., to adjust the performance and application range of the material.