Molybdenum tantalum target

Molybdenum-tantalum target is an important material for physical research and semiconductor manufacturing. Molybdenum (Mo): Molybdenum is a transition metal element with excellent high temperature properties and chemical stability. In the molybdenum tantalum target, molybdenum is usually one of the main constituent elements. Tantalum (Ta): Tantalum is a rare metal element with high melting point and chemical stability. It is another important constituent element of molybdenum tantalum target.

Classification:

Sputtering target

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Product Introduction

Molybdenum-tantalum target is an important material for physical research and semiconductor manufacturing.

Molybdenum (Mo): Molybdenum is a transition metal element with excellent high temperature properties and chemical stability. In the molybdenum tantalum target, molybdenum is usually one of the main constituent elements.

Tantalum (Ta): Tantalum is a rare metal element with high melting point and chemical stability. It is another important constituent element of molybdenum tantalum target.

Physical Performance

High melting point: Both molybdenum and tantalum have extremely high melting points, 2623°C and 3017°C respectively, so the molybdenum tantalum target has excellent high temperature resistance.

High density: Both molybdenum and tantalum have high density. The density of molybdenum is about 10.2g/cm3, and the density of tantalum is about 16.7g/cm3, so the molybdenum tantalum target has a high mass absorption capacity.

Application areas

Physical research: molybdenum tantalum target is commonly used in the field of physical research, such as nuclear physics experiments, particle accelerators, plasma physics, etc., used to produce high-energy ion beams or electron beams.

Semiconductor manufacturing: In the semiconductor manufacturing process, molybdenum tantalum targets are often used in physical vapor deposition (PVD) or magnetron sputtering (sputtering) processes, such as deposition or plating thin films, the preparation of electronic devices, optical devices or coating materials.

Preparation method

Powder metallurgy method: after mixing molybdenum and tantalum powder according to a certain proportion, after pressing, sintering and other processes to prepare a massive or flaky molybdenum tantalum target.

Melting method: molybdenum and tantalum can be prepared by vacuum melting or plasma arc melting and other methods into a block or flake molybdenum tantalum target.

special alloy

Sometimes, in order to improve the characteristics of the target, the molybdenum tantalum target may be added with other elements, such as chromium (Cr), niobium (Nb), etc., to adjust the performance and application range of the material.